| 摘要 |
FIELD: physics. ^ SUBSTANCE: ion gun system (60) has an ion gun (14) for emitting a beam of ions; an electric power supply unit (61) for powering the ion gun; two mass flow regulators (64, 65) for feeding each of the two types of gases into the ion gun; a control unit (12) connected to the electric power supply unit and operating as a means of controlling the ion gun in order to control power supplied to the ion gun from the electric power supply unit; and a control unit (12) connected to the mass flow regulators and operating as a means of controlling mass flow in order to control flow of gas fed into the ion gun from the mass flow regulators, wherein the control unit (12) as a means of controlling mass flow is provided with such a function that the given flow value for each of the two types of fed gases varies step by step within the range of stable operation of the ion gun and change to another given value is realised. ^ EFFECT: shorter time of forming a film. ^ 27 cl, 5 dwg, 1 tbl, 2 ex |
