SUBSTRATE PROCESSING METHOD FOR PHOTOLITHOGRAPHY PROCESS

摘要

PURPOSE: A substrate processing method for a photolithographic process is provided to efficiently manage the continuous processing of substrates by minimizing environmental temperature set-up time for a bake. CONSTITUTION: Bake temperature is identified through a process recipe of preceding substrates and following substrates. The temperature of a bake module(220) is set for each preceding substrates and following substrates if the bake temperature of the preceding substrates and the following substrates is different. Bake modules are divided into a bake module(220a) in a first group baking the preceding substrates and a bake module(220b) in a second group baking the following substrates and set to be the bake temperature of each corresponding process recipe in a temperature set-up step.