TEXTURE ETCHING SOLUTION COMPOSITION AND TEXTURE ETCHING METHOD OF CRYSTALLINE SILICON WAFERS

摘要

PURPOSE: A texture etchant composition is provided to maximize absorption of solar light by improving uniformity of a texture structure, and to increase photo efficiency by lowering light reflectivity, and to increase productivity, because of not needing additional etching liquid component. CONSTITUTION: A texture etchant composition comprises 0.1-20 weight% of an alkali compound, 0.000001-1 weight% of a polyoxyethylene based compound, a polyoxypropylene based compound, and residual water, and additionally comprises 0.1-50 weight% of a cyclic compound. A texture etching method of a crystalline silicon comprises a step of condensing and/or spraying crystalline silicon wafer by using the texture etching composition.