发明名称 |
Reaction tube and heat processing apparatus for a semiconductor process |
摘要 |
A reaction tube for a semiconductor process for performing a heat process on a plurality of target objects stacked at intervals under a vacuum state is integrally made of an electrically insulating and heat-resistant material. The reaction tube includes a cylindrical sidewall that has a load port at a lower end for loading and unloading the target objects to and from the reaction tube, and a circular ceiling wall that closes an upper end of the sidewall and has a flat inner surface extending in a direction perpendicular to an axial direction of the sidewall. The ceiling wall has an annular groove formed in a peripheral region of an outer surface along the sidewall. |
申请公布号 |
US8216378(B2) |
申请公布日期 |
2012.07.10 |
申请号 |
US20090408977 |
申请日期 |
2009.03.23 |
申请人 |
KANEKO HIROFUMI;INOUE HISASHI;SHIONAGA KEISHI;HISHIYA SHINGO;ENDOH ATSUSHI;TOKYO ELECTRON LIMITED |
发明人 |
KANEKO HIROFUMI;INOUE HISASHI;SHIONAGA KEISHI;HISHIYA SHINGO;ENDOH ATSUSHI |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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