METHOD FOR FABRICATING NONVOLATILE MEMORY DEVICE AND PHOTOMASK USED FOR THIS

摘要

PURPOSE: A method for manufacturing a non-volatile memory device and a photo-mask used for the same are provided to easily execute a follow-up process by uniformly controlling the width of a mask pattern. CONSTITUTION: A substrate(200) which includes a first area(A) and a second area(B) is provided. A lamination structure in which an interlayer dielectric layer(210) and a conductive layer(220) are alternately laminated on the substrate. A memory gate insulating layer(230) is placed between the lamination structure and a channel layer(240). A mask pattern covering the first area and a dummy mask pattern covering the second area are formed on the lamination structure. A slimming process for reducing the width of the mask pattern and the width of the dummy mask pattern is executed.