发明名称 |
Combinatorial approach to the development of cleaning formulations for wet removal of high dose implant photoresist |
摘要 |
Embodiments of the current invention describe a cleaning solution for the removal of high dose implanted photoresist, along with methods of applying the cleaning solution to remove the high dose implanted photoresist and combinatorially developing the cleaning solution.
|
申请公布号 |
US8216384(B2) |
申请公布日期 |
2012.07.10 |
申请号 |
US20090614310 |
申请日期 |
2009.11.06 |
申请人 |
KUMAR NITIN;ZHANG GUIZHEN;INTERMOLECULAR, INC. |
发明人 |
KUMAR NITIN;ZHANG GUIZHEN |
分类号 |
C23G1/02 |
主分类号 |
C23G1/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|