发明名称 Back-illuminated type imaging device and fabrication method thereof
摘要 Light is illuminated from a back-surface side of a silicon substrate 4. A back-illuminated type imaging device 100 reads out, from a front-surface side of the silicon substrate 4, charges that are generated in the silicon substrate 4 in response to the illuminated light, so as to perform imaging. The back-illuminated type imaging device 100 includes pad portions 17 formed on the back surface of the semiconductor substrate 4, and a plurality of pillars 9 that are formed in the semiconductor substrate 4, are made of a conductive material and electrically connect wiring portions 12 formed on the front surface of the semiconductor substrate 4 and the pad portions 17 to each other.
申请公布号 US8216873(B2) 申请公布日期 2012.07.10
申请号 US201113100475 申请日期 2011.05.04
申请人 UYA SHINJI;FUJIFILM CORPORATION 发明人 UYA SHINJI
分类号 H01L21/28 主分类号 H01L21/28
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