| 摘要 |
PURPOSE: An apparatus for processing a substrate and method thereof are provided to prevent pollution of the bottom side of a substrate by preventing a flow of scattered fluid to the bottom side of the substrate from the top side. CONSTITUTION: A supporting member(110) supports a substrate(11) in a process. The supporting member includes a spin head(111), a supporting pin(112), a chunking pin(113) and a supporting shaft(114). A container(120) includes a plurality of collecting tanks(120a,120b,120c) collecting used treatment liquid in a process. An elevating unit(200) moves the container up and down. An upper nozzle unit(300) sprays an organic solvent and a drying gas on the upper side of the substrate. An organic solvent supplying unit(330) supplies IPA(Isopropyl Alcohol) to an organic solvent spray nozzle(312).
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