发明名称 Pattern formation employing self-assembled material
摘要 In one embodiment, Hexagonal tiles encompassing a large are divided into three groups, each containing⅓of all hexagonal tiles that are disjoined among one another. Openings for the hexagonal tiles in each group are formed in a template layer, and a set of self-assembling block copolymers is applied and patterned within each opening. This process is repeated three times to encompass all three groups, resulting in a self-aligned pattern extending over a wide area. In another embodiment, the large area is divided into rectangular tiles of two non-overlapping and complementary groups. Each rectangular area has a width less than the range of order of self-assembling block copolymers. Self-assembled self-aligned line and space structures are formed in each group in a sequential manner so that a line and space pattern is formed over a large area extending beyond the range of order.
申请公布号 US8215074(B2) 申请公布日期 2012.07.10
申请号 US20080026123 申请日期 2008.02.05
申请人 BLACK CHARLES T.;DALTON TIMOTHY J.;DORIS BRUCE B.;RADENS CARL;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BLACK CHARLES T.;DALTON TIMOTHY J.;DORIS BRUCE B.;RADENS CARL
分类号 E04B2/00 主分类号 E04B2/00
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