发明名称 GAN SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A GaN(Nitride Gallium) substrate and a manufacturing method thereof are provided to control bending by injecting a lattice constant control material if a nitride gallium film, which is grown up on both sides, is bent. CONSTITUTION: A GaN(Nitride Gallium) film is simultaneously grown up on both top and down sides of a base substrate(S210). It is checked whether the bending degree of the GaN film is over a critical value in real-time(S220). A lattice constant control material is injected into the GaN film having bending(S230). The critical value is a numerical value causing a crack on either the base substrate or the GaN film.
申请公布号 KR20120078125(A) 申请公布日期 2012.07.10
申请号 KR20100140329 申请日期 2010.12.31
申请人 SAMSUNG CORNING PRECISION MATERIALS CO., LTD. 发明人 BAE, JUN YOUNG;PARK, HYUN JONG;CHOI, JUN SUNG;KIM, DONG HYUN;LEE, WON JO;PARK, CHEOL MIN;LEE, DONG WOOK;SHIN, SEONG HWAN
分类号 H01L21/20 主分类号 H01L21/20
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