FABRICATION OF TITANIUM SINTERED-BODY FOR SPUTTERING TARGET

摘要

PURPOSE: A manufacturing method of a sintered titanium body for a sputtering target is provided to manufacture a high-purity sintered body, which does not have a temperature deviation, in a short time. CONSTITUTION: A manufacturing method of a sintered titanium body for a sputtering target is as follows. A mold(200) made of a graphite material' is filled with titanium powder(205). The mold is installed inside a chamber(110) of a discharge plasma sintering machine(100). The inside the chamber is vacuumized. The titanium powder is heated according to a set heating pattern and is molded till reaching a final target temperature. The final target temperature stays for 2 to 4 minutes. The inside the chamber is cooled.