发明名称 |
WAFER CUTTING METHOD AND SYSTEM USING LASER BEAM |
摘要 |
PURPOSE: A wafer cutting method and system using a laser beam are provided to obtain uniform cut profiles by moving a wafer orthogonally at 45 degrees to the projection direction of a laser. CONSTITUTION: A wafer cutting method is as follows. A wafer is cut by the projection of a laser beam with an oval type focus having a long x-axis and a short y-axis. The angle between the long and short axes of the laser beam and X and Y axes of wafer cutting lines is 45 degrees. The X and Y axes meet each other at the right angle. The laser beam is projected along the X axis to cut the wafer and then the wafer is rotated by 90 degrees to cut the wafer along the Y axis. |
申请公布号 |
KR20120076861(A) |
申请公布日期 |
2012.07.10 |
申请号 |
KR20100138602 |
申请日期 |
2010.12.30 |
申请人 |
OPTOCHEM CO., LTD. |
发明人 |
PARK, IL HONG;KIM, HYUNG WON;YOON, TAE OH |
分类号 |
B23K26/38;B23K26/14;H01L21/304 |
主分类号 |
B23K26/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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