发明名称 Photoacid generator and photoreactive composition
摘要 A photoacid generator, which shows very high sensitivity in the near ultraviolet range of about 300 to 400 nm, and also can remarkably increase a reaction rate of a photoreactive composition using the same, and a photoreactive composition which can initiate the reaction even by irradiation with near ultraviolet light within a short time and also can obtain a desired reaction product. A dithienyl sulfide disulfonium salt represented by the formula (A1): a dithienyl sulfide sulfonium salt represented by the formula (B1): and a phenylthiothiophene sulfonium salt represented by the formula (C1):
申请公布号 US8216768(B2) 申请公布日期 2012.07.10
申请号 US20080741325 申请日期 2008.10.30
申请人 YAMAMOTO KATSUMASA;YAMAGUCHI HIROFUMI;SUZUKI MICHIO;SUMITOMO SEIKA CHEMICALS CO., LTD. 发明人 YAMAMOTO KATSUMASA;YAMAGUCHI HIROFUMI;SUZUKI MICHIO
分类号 G03F7/004;C07D409/12;G03F7/028 主分类号 G03F7/004
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