发明名称 |
Photoacid generator and photoreactive composition |
摘要 |
A photoacid generator, which shows very high sensitivity in the near ultraviolet range of about 300 to 400 nm, and also can remarkably increase a reaction rate of a photoreactive composition using the same, and a photoreactive composition which can initiate the reaction even by irradiation with near ultraviolet light within a short time and also can obtain a desired reaction product. A dithienyl sulfide disulfonium salt represented by the formula (A1): a dithienyl sulfide sulfonium salt represented by the formula (B1): and a phenylthiothiophene sulfonium salt represented by the formula (C1):
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申请公布号 |
US8216768(B2) |
申请公布日期 |
2012.07.10 |
申请号 |
US20080741325 |
申请日期 |
2008.10.30 |
申请人 |
YAMAMOTO KATSUMASA;YAMAGUCHI HIROFUMI;SUZUKI MICHIO;SUMITOMO SEIKA CHEMICALS CO., LTD. |
发明人 |
YAMAMOTO KATSUMASA;YAMAGUCHI HIROFUMI;SUZUKI MICHIO |
分类号 |
G03F7/004;C07D409/12;G03F7/028 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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