SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to improve cleaning efficiency by controlling a particle diameter and flux. CONSTITUTION: A processing container collects distributed processing liquid on a substrate in order to surround around a spin head. A movement nozzle unit sprays the processing liquid to the substrate putting on the spin head. A nozzle body(312) includes a plurality of discharging outlets(314) on a floor side and has an internal space in which cleaning fluid is filled. A piezoelectric element(330) adds pressure to the cleaning fluid filled in the internal space and allows the washing solution to be sprayed through the discharging outlets.