| 摘要 |
PURPOSE: An exhaust member and a substrate processing apparatus are provided to regularly control the flux of a processed object exhausted from a plurality of exhaust pipes by controlling the opening and closing of an on/off valve of the exhaust pipe. CONSTITUTION: A substrate support member is installed within a processing chamber and supports a substrate. A gas supply member supplies process gas to the substrate. An exhaust member(500) discharges a processed object within the processing chamber. The exhaust member includes an exhaust ring(510), a plurality of exhaust pipes(520), a temperature sensor installed at the exhaust pipe, and an on/off valve installed at the exhaust pipe. The exhaust ring surrounds the outer side of the substrate support member while being spaced and includes a plurality of exhaust holes. The plurality of exhaust pipes is combined with the lower part of the exhaust ring.
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