Device manufacturing method and lithographic apparatus,and computer program product

摘要

In a lithographic printing process a substrate is moved, in the scanning direction, relative to a patterned beam of radiation being projected onto it during a scanning exposure of a pattern feature. An image of the pattern feature is blurred in the scanning direction. The effect of the blurring is used to reduce a difference of critical dimension between similar horizontal and vertical features. The effect on critical dimension may be obtained by providing an amount of anamorphic magnification to the projection system.