COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

摘要

PURPOSE: A coated substrate, a photoresist relief image forming method, and an antireflective composition for being used with an over-coated photoresist composition are provided to reduce the reflection of irradiated exposure rays from the substrate to an over-coated photoresist layer. CONSTITUTION: A coated substrate includes a coating composition layer on a substrate and a photoresist layer on the coating composition layer. The coating composition includes one or more components with parabanic acid moieties. The components are resins and include polyester bond. The resins further include one or more cyanurate groups and/or uracil groups. A photoresist relief image forming method includes the following: the coating composition is applied on the substrate; a photoresist composition is applied on the coating composition layer; the photoresist layer is exposed and developed to form the photoresist relief image.