发明名称 |
OPTICAL ARRANGEMENT IN AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS |
摘要 |
An optical arrangement in an optical system, such as a microlithographic projection exposure apparatus, includes: at least one heat-emitting subsystem which emits heat during the operation of the optical system; a first heat shield which is arranged such that it at least partly absorbs the heat emitted by the heat-emitting subsystem; a first cooling device which is in mechanical contact with the first heat shield and is designed to dissipate heat from the first heat shield; and a second heat shield which at least partly absorbs heat emitted by the first heat shield. The second heat shield is in mechanical contact with a cooling device that dissipates heat from the second heat shield. |
申请公布号 |
KR20120076360(A) |
申请公布日期 |
2012.07.09 |
申请号 |
KR20127010772 |
申请日期 |
2010.09.22 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
LAUFER TIMO;SAUERHOFER ALEXANDER |
分类号 |
G02B7/18;G02B7/192;G03F7/20;H01L21/027 |
主分类号 |
G02B7/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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