INCLUSION COMPOUND AND RADIATION-SENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a mixture and a radiation-sensitive composition which can comparatively easily produce a resist material capable of giving a resist pattern with a little roughness.

SOLUTION: A mixture contains 80 wt.% or more of an inclusion compound formed of (A) a calix resorcin arene compound with a molecular weight of 500 to 5,000 and (B) an acid generator.

COPYRIGHT: (C)2012,JPO&INPIT