| 摘要 |
PURPOSE: A chemical vapor deposition apparatus is provided to accurately detect the temperature of a susceptor with a temperature sensor by simply correcting the interval between the susceptor and the temperature sensor so that the temperature sensor contacts the susceptor. CONSTITUTION: A chemical vapor deposition apparatus(100) comprises a chamber(110), a susceptor(150), a heating unit(170), a rotary shaft(160), a temperature sensor(190), and a temperature sensor lifting unit(200). The chamber is provided with processing gas. The susceptor is arranged inside the chamber and supports a substrate on one side thereof. The heating unit is located separately from the rear face of the susceptor and heats the susceptor. The rotary shaft supports the susceptor being rotated. The temperature sensor passes through the rotary shaft along the length of the rotary shaft and detects the temperature of the susceptor. The temperature sensor lifting unit moves the temperature sensor up and down.
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