| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve such a problem that the line width roughness (LWR) of an obtained resist pattern is not necessarily satisfactory in the conventional resist composition. <P>SOLUTION: The salt is represented by formula (I). [In the formula, Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>each independently represent a fluorine atom or a 1-6C perfluoroalkyl group. X<SP POS="POST">1</SP>represents a 1-17C bivalent saturated hydrocarbon group, a hydrogen atom contained in the bivalent saturated hydrocarbon group may be substituted with a fluorine atom, a methylene group contained in the bivalent saturated hydrocarbon group may be substituted with an oxygen atom or a carbonyl group. R<SP POS="POST">1</SP>represents a 1-20C hydrocarbon group, a hydrogen atom contained the hydrocarbon group may be substituted with a hydroxy group, a cyano group or a nitro group, and a methylene group contained in the hydrocarbon group may be substituted with an oxygen atom or a carbonyl group. Z<SP POS="POST">1+</SP>represents organic cation]. <P>COPYRIGHT: (C)2012,JPO&INPIT |
