COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide reliable and convenient photoresist and imaging processes for immersion lithography, and to provide overcoat layer compositions applied onto a photoresist for use e.g. in immersion lithography processing and in non-immersion imaging.

SOLUTION: A coated substrate includes a photoresist composition layer on the substrate, and an organic composition containing a copolymer resin containing one or more hydrophilic groups on the photoresist layer.

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