发明名称 FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
摘要 A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction.
申请公布号 US2012171622(A1) 申请公布日期 2012.07.05
申请号 US201113330776 申请日期 2011.12.20
申请人 IIZUKA NAOYA;MASAKI FUMITARO;MIYAKE AKIRA;CANON KABUSHIKI KAISHA 发明人 IIZUKA NAOYA;MASAKI FUMITARO;MIYAKE AKIRA
分类号 H01L21/77;G02B27/10;G03B27/54;G03F7/26 主分类号 H01L21/77
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