<p>PURPOSE: An apparatus and method for manufacturing a thin film are provided to prevent defects in a thin film on a substrate by preventing ions from being inputted to the substrate in a sputtering process. CONSTITUTION: A sensor(100) senses a polarity of a substrate(S) and senses the polarity of ions inputted to the substrate or the polarity of charges on the substrate. The sensor is separately formed in the rear of the substrate. A pulse source(200) applies a pulse voltage or pulse current to the substrate. A synchronization module(300) applies the pulse voltage or pulse current with the same polarity as the polarity of the substrate to the substrate.</p>
申请公布号
KR20120074199(A)
申请公布日期
2012.07.05
申请号
KR20110112127
申请日期
2011.10.31
申请人
AVACO CO., LTD.
发明人
PARK, WAN WOO;OH, JONG SEOK;JUNG, JONG YEOP;HWANG, JAI KOON;HAN, DEOK WOO;LEE, SEOK JIN