发明名称 APPARAUS AND METHOD FOR MANUFACTURING THIN FILM
摘要 <p>PURPOSE: An apparatus and method for manufacturing a thin film are provided to prevent defects in a thin film on a substrate by preventing ions from being inputted to the substrate in a sputtering process. CONSTITUTION: A sensor(100) senses a polarity of a substrate(S) and senses the polarity of ions inputted to the substrate or the polarity of charges on the substrate. The sensor is separately formed in the rear of the substrate. A pulse source(200) applies a pulse voltage or pulse current to the substrate. A synchronization module(300) applies the pulse voltage or pulse current with the same polarity as the polarity of the substrate to the substrate.</p>
申请公布号 KR20120074199(A) 申请公布日期 2012.07.05
申请号 KR20110112127 申请日期 2011.10.31
申请人 AVACO CO., LTD. 发明人 PARK, WAN WOO;OH, JONG SEOK;JUNG, JONG YEOP;HWANG, JAI KOON;HAN, DEOK WOO;LEE, SEOK JIN
分类号 H01L31/18;H01L31/0445 主分类号 H01L31/18
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