| 摘要 |
An immersion exposure apparatus includes a light source, a projection lens set, a photomask, a liquid medium, and a supporting stage. The projection lens set has a front surface facing the light source and a first back surface facing away from the light source. The photomask has a second back surface facing away from the light source. The photomask is disposed between the light source and the projection lens set. The liquid medium is disposed the front surface and the second back surface. The liquid medium contacts the front surface and the second back surface. The supporting stage is disposed at a side of the first back surface of the projection lens set. A substrate is disposed on the supporting stage. The liquid medium may be water or other liquid.
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