| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laser processing method by which a substrate without particle contamination and patterned by high-quality thin film can be attained at high yield, and to provide a laser processor. <P>SOLUTION: The laser processor includes: a conveyance means for conveying a substrate 1 along a predetermined route; a liquid tank 20 that is arranged so that the substrate 1 may be immersed in a liquid 21 on the midway of the conveyance route for the substrate and be taken out therefrom; a laser beam irradiation device 30 that directs a laser beam to a thin film through the liquid 21 in the liquid tank 20 to pattern the thin film into a predetermined shape; and a liquid removing device 40 for removing a liquid adhered to the surface of the substrate taken out from the liquid tank 20. The laser processor is used to process the substrate having a thin film with a laser. <P>COPYRIGHT: (C)2012,JPO&INPIT |
