A METHOD FOR MODIFYING A GATE DIELECTRIC STACK CONTAINING A HIGH-K LAYER USING PLASMA PROCESSING,申请号KR20077003092-传众专利搜索

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发明名称	A METHOD FOR MODIFYING A GATE DIELECTRIC STACK CONTAINING A HIGH-K LAYER USING PLASMA PROCESSING
摘要
申请公布号	KR101163264(B1)	申请公布日期	2012.07.05
申请号	KR20077003092	申请日期	2005.08.11
申请人		发明人
分类号	H01L21/314;H01L21/28;H01L21/31;H01L21/316	主分类号	H01L21/314
代理机构		代理人
主权项
地址

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