| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate defect checkup system and a substrate defect checkup method that enable the quantity of distortion a substrate itself involves to be corrected and the substrate to be checked up accurately even if the substrate has lost much of its thickness, and a conveying apparatus that can convey a substrate while correcting the quantity of distortion a substrate itself involves and maintaining the substrate in an examinable range. <P>SOLUTION: In a substrate defect checkup system or a substrate defect checkup method by which a substrate is mounted, conveyed to an examination area for examining the substrate, and photographed by irradiating the examination area with examining light to check up any defect in the substrate, the substrate is reformed into a curved shape and subjected to the examination using a plurality of optical checkup units arranged along the curved shape. <P>COPYRIGHT: (C)2012,JPO&INPIT |
