发明名称 SPUTTERING DEVICE
摘要 Provided is a means capable of cleaning necessary parts accurately and quickly by determining the surface condition of a target. The means is equipped with a magnet unit (4) capable of generating a magnetic field on the surface of the target (5), a rotating system (8) capable of changing the magnetic field formation pattern that corresponds to the position and the intensity of the magnetic field to be generated on the target surface by driving the magnetic unit, and an ammeter (59) for measuring a target current when a discharge voltage is applied to a target electrode, to which the target is attached, while the magnetic field is generated by the magnet unit. By measuring the target current at each position of the magnet unit while varying the position using the rotating system and by comparing the target current with a reference value, whether cleaning is required at each position or not is determined, so only the parts that require cleaning can be treated.
申请公布号 WO2012090475(A1) 申请公布日期 2012.07.05
申请号 WO2011JP07275 申请日期 2011.12.26
申请人 CANON ANELVA CORPORATION;SHIBUYA, YOHSUKE 发明人 SHIBUYA, YOHSUKE
分类号 C23C14/34;C23C14/35;H01L21/285 主分类号 C23C14/34
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