发明名称 Photosensor and Method of Manufacturing the Same
摘要 In a photosensor and a method of manufacturing the same, the photosensor comprises: an intrinsic silicon layer formed on a substrate; a P-type doped region formed in a same plane with the intrinsic silicon layer; and an oxide semiconductor layer formed on or under the intrinsic silicon layer, and overlapping an entire region of the intrinsic silicon layer.
申请公布号 US2012168745(A1) 申请公布日期 2012.07.05
申请号 US201113239627 申请日期 2011.09.22
申请人 OH JAE-HWAN;LEE WON-KYU;JIN SEONG-HYUN;CHANG YOUNG-JIN;CHOI JAE-BEOM;SAMSUNG MOBILE DISPLAY CO., LTD. 发明人 OH JAE-HWAN;LEE WON-KYU;JIN SEONG-HYUN;CHANG YOUNG-JIN;CHOI JAE-BEOM
分类号 H01L31/0264;H01L31/20 主分类号 H01L31/0264
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