| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of forming a metal oxide film with uniform film thickness on an optical element having a concave surface. <P>SOLUTION: The antireflection film forming method includes a sputter processing step, re-sputter processing step, and an oxidation process step. A sputtered particle discharged from a metal target is deposited onto a concave surface 2a of an optical element 2 to form a metal layer 11 (the sputter processing step). Next, the metal film formed in the sputter processing step is irradiated with an ion beam i to deposit a sputtered particle sa discharged from the metal layer 11 onto the concave surface 2a of the optical element 2 again to form a metal layer 11A (the re-sputter processing step). At this time, mainly metal on a center portion of the concave surface 2a is sputtered and the sputtered particle sa is deposited on a peripheral portion of the concave portion 2a. Next, the metal film 11A formed in the re-sputter processing step irradiated with an oxygen radical beam for oxidation to form a metal oxide film 15 (the oxidation process step). <P>COPYRIGHT: (C)2012,JPO&INPIT |
