发明名称 |
METHOD FOR COMPENSATING FOR VARIATIONS IN STRUCTURES OF AN INTEGRATED CIRCUIT |
摘要 |
A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.
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申请公布号 |
US2012174046(A1) |
申请公布日期 |
2012.07.05 |
申请号 |
US201213412725 |
申请日期 |
2012.03.06 |
申请人 |
CREDENDINO SANTO;HULVEY MICHAEL D.;KUPPUSAMY JOTHIMALAR;LEIDY ROBERT KENNETH;PASTEL PAUL WILLIAM;PORTH BRUCE WALTER;STAMPER ANTHONY K.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CREDENDINO SANTO;HULVEY MICHAEL D.;KUPPUSAMY JOTHIMALAR;LEIDY ROBERT KENNETH;PASTEL PAUL WILLIAM;PORTH BRUCE WALTER;STAMPER ANTHONY K. |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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