| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition excellent in roughness characteristics, focus latitude, bridge defect preventing performance and dependency of sensitivity on post exposure baking (PEB) temperature, and a pattern forming method using the composition. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises: a resin, which contains a first repeating unit having a group that is decomposed by an action of an acid to produce an alcoholic hydroxyl group, and the solubility of which with a developing solution containing an organic solvent is decreased by the action of the acid; a first compound that generates an acid by irradiation with actinic rays or radiation; a solvent; and a second compound having at least one of a fluorine atom and a silicon atom and having basicity or increasing basicity by the action of the acid. <P>COPYRIGHT: (C)2012,JPO&INPIT |
