| 摘要 |
A method for fabricating a fine pattern includes forming a line-shaped partition pattern on an underlayer, adhering a first spacer to the sides of the partition pattern, dividing the first spacer into two line patterns where one line pattern has one end bent by selectively etching the first spacer portion with a division region, adhering a second spacer, which has a connection protrusion filling the division region and connecting to the partition pattern, to the outer side of the two line patterns, and selectively removing the two line patterns.
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