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发明名称
SODIUM SALT CONTAINING CIG TARGETS, METHODS OF MAKING AND METHODS OF USE THEREOF
摘要
A sputtering target includes at least one metal selected from copper, indium and gallium and a sodium containing compound.
申请公布号
WO2012054467(A3)
申请公布日期
2012.07.05
申请号
WO2011US56689
申请日期
2011.10.18
申请人
MIASOLE;JULIANO, DANIEL R.;TAS, ROBERT;MACKIE, NEIL M.;ZIANI, ABDELOUAHAB
发明人
JULIANO, DANIEL R.;TAS, ROBERT;MACKIE, NEIL M.;ZIANI, ABDELOUAHAB
分类号
C23C14/34;H01L31/042;H01L31/18
主分类号
C23C14/34
代理机构
代理人
主权项
地址
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