DIMENSION MEASUREMENT METHOD AND DIMENSION MEASUREMENT DEVICE

摘要

This dimension measurement method detects a characteristic pattern (41) by image recognition of the measurement target substrate (30) to measure a dimension of a measurement target substrate (30) in order to analyze deformation of the measurement target substrate (30), and comprises a steps for: setting as the characteristic pattern (41) a pattern on the measurement target substrate (30) identified by a plurality of lines including at least two non-parallel lines; acquiring image data using as a detection region a region which includes the characteristic pattern (41) to detect the characteristic pattern (41); and thereafter calculating the dimension of the measurement target substrate (30) from positional information of the detected characteristic pattern (41).