| 发明名称 |
APPARATUS AND METHOD OF APPLYING A FILM TO A SEMICONDUCTOR WAFER AND METHOD OF PROCESSING A SEMICONDUCTOR WAFER |
| 摘要 |
Implementations and techniques for applying a film to a semiconductor wafer and for processing a semiconductor wafer are generally disclosed. |
| 申请公布号 |
US2012168940(A1) |
申请公布日期 |
2012.07.05 |
| 申请号 |
US201013394812 |
申请日期 |
2010.10.14 |
| 申请人 |
BIECK FLORIAN;EMPIRE TECHNOLOGY DEVELOPMENT LLC |
发明人 |
BIECK FLORIAN |
| 分类号 |
H01L23/48;B32B37/10;B32B38/10;H01L21/31 |
主分类号 |
H01L23/48 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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