METHOD OF FABRICATING THIN FILM TRANSISTOR SUBSTRATE AND PHOTORESIST COMPOSITION USED THEREIN

摘要

PURPOSE: A positive type photoresist composition and a method for manufacturing a thin film transistor display panel using the same are provided to improve film speed, residual film rate, development contrast, and resolution. CONSTITUTION: A positive type photoresist composition includes an alkali soluble novolak resin, a diazonaphthoquinone compound, an adhesion increasing agent, and an organic solvent. The adhesion increasing agent is bis(1,2,2,6,6-pentamethyl-4-piperidinyl)-((3,5-bis(1,1-dimethylethyl)-4-hydroxyphenyl)methyl)butylmalonate which is represented by chemical formula 1. The content of the adhesion increasing agent is in a range between 0.01 and 10 weight%.