发明名称 RELIABLE INTERCONNECT INTEGRATION SCHEME
摘要 Embodiments relate to a method for forming reliable interconnects by preparing a substrate with a dielectric layer, processing the dielectric layer to serve as an IMD layer, wherein the IMD layer comprises a hybrid IMD layer comprising a plurality of dielectric materials with different k values.
申请公布号 US2012168915(A1) 申请公布日期 2012.07.05
申请号 US20100982862 申请日期 2010.12.30
申请人 DU LUYING;ZHANG FAN;CHEN JUN;ZHANG BEI CHAO;TAN JUAN BOON;GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 DU LUYING;ZHANG FAN;CHEN JUN;ZHANG BEI CHAO;TAN JUAN BOON
分类号 H01L29/02;H01L21/302 主分类号 H01L29/02
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