发明名称 Method and System for Manufacturing Silicon and Silicon Carbide
摘要 The present invention provides a method of manufacturing silicon and a manufacturing system for manufacturing and extracting silicon by grinding silicon carbide and silica, mixing each at predetermined ratio after cleaning them, housing them in a crucible, heating this by a heating unit to make them react, oxidizing the silicon carbide with the silica and further, reducing the silica with the silicon carbide. The present invention further provides a method of simultaneously manufacturing silicon and silicon carbide and a manufacturing system for producing silicon carbide by forming a silicon carbide film by vapor phase epitaxy using active gas generated in heating for reaction for material and recovering the silicon carbide film.
申请公布号 US2012171848(A1) 申请公布日期 2012.07.05
申请号 US201213351638 申请日期 2012.01.17
申请人 TOMITA TAKASHI;TAKASHI TOMITA 发明人 TOMITA TAKASHI
分类号 H01L21/20;B01J19/00 主分类号 H01L21/20
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