AROMATIC HYDROCARBON RESIN, COMPOSITION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, AND METHOD FOR FORMING MULTILAYER RESIST PATTERN

摘要

The purpose is to provide a high-carbon, low-oxygen aromatic hydrocarbon resin that can be used as a coating agent for semiconductors and/or a resin for resists; and to provide a composition for forming a lithographic underlayer film having superior etching resistance as an underlayer film for multilayer resist processing, to provide an underlayer film formed from the composition, and to provide a method for forming a pattern using the underlayer film. The invention is characterized in that an aromatic hydrocarbon, an aromatic aldehyde, and a phenol derivative are reacted in the presence of an acidic catalyst to obtain an aromatic hydrocarbon resin having a high carbon concentration of 90-99.9 mass% and a solubility of 10 mass% or greater in propylene glycol monomethyl ether acetate.