Microlithographic projection exposure system i.e. vacuum projection exposure system, operating method, involves changing bandwidth of projection light produced by light sources of system while exposing regions on photosensitive layer

摘要

The method involves imaging a mask (14) on a photosensitive layer (22) for exposure of the mask. Bandwidth of projection light produced by light sources of a projection exposure system (10) is changed while exposing coherent regions on the photosensitive layer or between two exposures. The bandwidth is changed depending on an arrangement of imaging structures (18) in the mask. Spacing is formed between the photosensitive layer, and a projection lens (20) of the projection exposure system is changed during change of the bandwidth. An independent claim is also included for a microlithographic projection exposure system comprising light sources.