METROLOGY METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND SUBSTRATE COMPRISING METROLOGY TARGETS,申请号EP20100740632-传众专利搜索

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发明名称	METROLOGY METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND SUBSTRATE COMPRISING METROLOGY TARGETS
摘要
申请公布号	EP2470960(A1)	申请公布日期	2012.07.04
申请号	EP20100740632	申请日期	2010.08.05
申请人	ASML NETHERLANDS BV	发明人	SMILDE, HENDRIK;DEN BOEF, ARIE;COENE, WILLEM;BLEEKER, ARNO;KOOLEN, ARMAND;PELLEMANS, HENRICUS;PLUG, REINDER
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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