发明名称 |
Coating compositions for use with an overcoated photoresist |
摘要 |
<p>Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.</p> |
申请公布号 |
EP2472328(A1) |
申请公布日期 |
2012.07.04 |
申请号 |
EP20110195277 |
申请日期 |
2011.12.22 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
JAIN, VIPUL;ONGAYI, OWENDI;COLEY, SUZANNE;ZAMPINI, ANTHONY |
分类号 |
G03F7/09;G03F7/11 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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