| 摘要 |
PURPOSE: An apparatus for cleaning CVD(Chemical Vapor Deposition) apparatus is provided to prevent uneven temperature distribution which can be generated due to residues by automatically eliminating the residues remaining within a susceptor using a gas outlet located on a sidewall of the susceptor. CONSTITUTION: A susceptor(130) includes a bottom part and a sidewall. A flat part is formed on the sidewall of the susceptor in order to easily mounting a wafer. A gas supply part(145) supplies gas to the susceptor. A gas outlet(140) discharges the gas to eliminate the residues existing on a bottom portion of the susceptor. The gas outlet is formed on an inner sidewall of the susceptor.
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