发明名称 |
Extreme ultra violet light source apparatus |
摘要 |
An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber. |
申请公布号 |
US8212228(B2) |
申请公布日期 |
2012.07.03 |
申请号 |
US20090382108 |
申请日期 |
2009.03.09 |
申请人 |
ABE TAMOTSU;NISHISAKA TOSHIHIRO;SOMEYA HIROSHI;MORIYA MASATO;ASAYAMA TAKESHI;HOSHINO HIDEO;MIZOGUCHI HAKARU;KOMATSU LTD.;GIGAPHOTON INC. |
发明人 |
ABE TAMOTSU;NISHISAKA TOSHIHIRO;SOMEYA HIROSHI;MORIYA MASATO;ASAYAMA TAKESHI;HOSHINO HIDEO;MIZOGUCHI HAKARU |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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