| 摘要 |
PURPOSE: An apparatus for setting a slit nozzle for treating a substrate is provided to smoothly implement a coating liquid drying process by improving the sealing performance of a substrate loading space. CONSTITUTION: An apparatus for setting a slit nozzle for treating a substrate includes a substrate chuck(110), an elastic seal(170), a slit nozzle, a first moving unit, a vacuum chamber cover, a vacuum forming unit, and a second moving unit. The substrate chuck sucks and fixes a substrate based on a plurality of sucking holes(111). The substrate chuck is based on a stone material. The elastic seal surrounds a substrate fixing region. The slit nozzle applies coating liquid on the surface of the substrate. The first moving unit relatively moves the slit nozzle about the substrate chuck. The lower part of the vacuum chamber cover is opened and is in contact with the elastic seal, and a sealed space is formed. The vacuum forming unit decompresses the sealed space. The second moving unit moves the vacuum chamber cover. |
