发明名称 Projection objective for microlithography
摘要 A projection objective for imaging a pattern arranged in an object surface of the projection objective into an image surface of the projection objective with a demagnified imaging scale has a plurality of optical elements which are arranged along an optical axis of the projection objective and are configured in such a way that a defined image field curvature of the projection objective is set in such a way that an object surface that is curved convexly with respect to the projection objective can be imaged into a planar image surface. What can be achieved given a suitable setting of the object surface curvature is that a gravitation-dictated bending of a mask does not have a disturbing effect on the imaging quality.
申请公布号 US8212988(B2) 申请公布日期 2012.07.03
申请号 US20050658574 申请日期 2005.08.03
申请人 GEH BERND;CARL ZEISS GMBH 发明人 GEH BERND
分类号 G03B27/42;G03F7/20 主分类号 G03B27/42
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