| 摘要 |
PURPOSE: A high-efficiency biphasic sputtering target is provided to improve utilization efficiency by differentiating the thickness of the sputtering target in consideration of consumption according to portion. CONSTITUTION: A high-efficiency biphasic sputtering target(10) comprises a first face(1) where sputtering takes place, a second face(2) which is attached to a support plate(20), a third face(3) forming both lateral sides, a first section(4) formed in the center portion, and a second section(5) extended from the first section toward the third face, where the thickness of the first section is smaller than that of the second section.
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