| 摘要 |
PURPOSE: A system for cleaning a slit nozzle in a substrate coating device and a cleaning method using the same are provided to stably secure the quality of a coating operation by fundamentally preventing the influence of impurities around the discharging hole of the slit nozzle. CONSTITUTION: A system(100) for cleaning a slit nozzle in a substrate coating device includes a tray(110), a cleaner(120), and a camera(140). The slit nozzle is moved to a cleaning position, and the tray is located under the slit nozzle. The tray collects impurities form the slit nozzle. The cleaner is located over the tray. The cleaner moves along the longitudinal direction of the discharging hole of the slit nozzle while being in contact with the circumferential surface of the discharging hole. The cleaner eliminates the impurities from the discharging hole. The camera photographs the cleaning state of the cleaner. |
